Abstract Deadline February 10, 2019


Abstract Submission Guidelines
Please prepare your abstract following the guidelines below.
Step 1
Each abstract should be a single page in length (including figures). The abstract must be submitted by This email address is being protected from spambots. You need JavaScript enabled to view it. as an Adobe PDF file created from the MSWord Template below.

Step 2
Select a topic to present your abstract from the list below.
Step 3
Please click the Submit Abstract button below and attach your abstract as a PDF file.

In the e-mail subject line please type in ASD 2019 Abstract Submission.
In the e-mail body please include your preferred topic from the list below. If you are a student, please note that as well.
Questions? E-mail This email address is being protected from spambots. You need JavaScript enabled to view it..

The conference will cover a wide range of topics, including the following:

Area selective epitaxy and area selective chemical vapor deposition: processes and mechanisms, defects control

Intrinsic selectivity of ALD processes: nucleation and interface studies, chemical selectivity in surface reactions, competitive adsorption,

precursors design, modeling of surface reactions

Methods for area selective activation / deactivation: use of inhibitors (self-assembled monolayers, polymers), plasma-/beam-induced activation

Processes and mechanisms for area selective atomic layer deposition: deposition of metals or dielectrics, thermal/plasma enhanced ALD, 3D or patterned substrates, substrates preparation, sequential deposition/etching,

Metrology and defects control: surface characterization techniques, selective etching of defects

Applications of area selective deposition: semiconductor industry (integration needs of device makers, solutions proposed by the equipment makers), catalysis, energy generation and storage, etc.